Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
نویسندگان
چکیده
Devices based on ferroelectric hafnium oxide are of major interest for sensor and memory applications. In particular, Si-doped layers investigated the application in front-end-of-line due to their resilience high thermal treatments. Due its very confined doping concentration range, Si:HfO2 atomic layer deposition often exhibited a crossflow pattern across 300 mm wafer. Here, plasma enhanced is explored as an alternative method producing HfO2 layers, pyroelectric properties compared.
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ژورنال
عنوان ژورنال: Crystals
سال: 2022
ISSN: ['2073-4352']
DOI: https://doi.org/10.3390/cryst12081115